Prati
Quoc Toan Le
Quoc Toan Le
imec, Leuven, Belgium
Potvrđena adresa e-pošte na imec.be
Naslov
Citirano
Citirano
Godina
Interfacial chemistry of and LiF with reactive metals
MG Mason, CW Tang, LS Hung, P Raychaudhuri, J Madathil, DJ Giesen, ...
Journal of Applied Physics 89 (5), 2756-2765, 2001
4132001
A photoelectron spectroscopy study on the indium tin oxide treatment by acids and bases
F Nüesch, LJ Rothberg, EW Forsythe, QT Le, Y Gao
Applied Physics Letters 74 (6), 880-882, 1999
3131999
Photoemission study of aluminum/tris-(8-hydroxyquinoline) aluminum and aluminum/LiF/tris-(8-hydroxyquinoline) aluminum interfaces
QT Le, L Yan, Y Gao, MG Mason, DJ Giesen, CW Tang
Journal of Applied Physics 87 (1), 375-379, 2000
2402000
Importance of indium tin oxide surface acido basicity for charge injection into organic materials based light emitting diodes
F Nüesch, EW Forsythe, QT Le, Y Gao, LJ Rothberg
Journal of Applied Physics 87 (11), 7973-7980, 2000
1982000
Photoemission study of the interface between phenyl diamine and treated indium–tin–oxide
QT Le, F Nüesch, LJ Rothberg, EW Forsythe, Y Gao
Applied physics letters 75 (10), 1357-1359, 1999
1051999
Analysis of titanium dental implants after failure of osseointegration: Combined histological, electron microscopy, and X‐ray photoelectron spectroscopy approach
A Arys, C Philippart, N Dourov, Y He, QT Le, JJ Pireaux
Journal of biomedical materials research 43 (3), 300-312, 1998
961998
The removal of copper oxides by ethyl alcohol monitored in situ by spectroscopic ellipsometry
A Satta, D Shamiryan, MR Baklanov, CM Whelan, QT Le, GP Beyer, ...
Journal of The Electrochemical Society 150 (5), G300, 2003
822003
Interface formation between NPB and processed indium tin oxide
QT Le, EW Forsythe, F Nüesch, LJ Rothberg, L Yan, Y Gao
Thin Solid Films 363 (1-2), 42-46, 2000
772000
Quantification of processing damage in porous low dielectric constant films
MR Baklanov, KP Mogilnikov, QT Le
Microelectronic Engineering 83 (11-12), 2287-2291, 2006
622006
Factors affecting an efficient sealing of porous low-k dielectrics by physical vapor deposition Ta(N) thin films
F Iacopi, Z Tőkei, QT Le, D Shamiryan, T Conard, B Brijs, U Kreissig, ...
Journal of applied physics 92 (3), 1548-1554, 2002
572002
Surface modification of PET films with RF plasma and adhesion of in situ evaporated Al on PET
QT Le, JJ Pireaux, JJ Verbist
Surface and interface analysis 22 (1‐12), 224-229, 1994
571994
Removal of plasma-modified low-k layer using dilute HF: Influence of concentration
QT Le, MR Baklanov, E Kesters, A Azioune, H Struyf, W Boullart, ...
Electrochemical and Solid-State Letters 8 (7), F21, 2005
562005
XPS/AFM study of the PET surface modified by oxygen and carbon dioxide plasmas: Al/PET adhesion
QT Le, JJ Pireaux, R Caudano, P Leclere, R Lazzaroni
Journal of adhesion science and technology 12 (9), 999-1023, 1998
521998
XPS study of the PET film surface modified by CO2 plasma: effects of the plasma parameters and ageing
QT Le, JJ Pireaux, R Caudano
Journal of adhesion science and technology 11 (5), 735-751, 1997
511997
Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues
QT Le, JF de Marneffe, T Conard, I Vaesen, H Struyf, G Vereecke
Journal of The Electrochemical Society 159 (3), H208, 2011
322011
Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces
QT Le, M Claes, T Conard, E Kesters, M Lux, G Vereecke
Microelectronic engineering 86 (2), 181-185, 2009
312009
Sealing of Porous Low-k Dielectrics: Ellipsometric Porosimetry Study of Oxidized Films
CM Whelan, QT Le, F Cecchet, A Satta, JJ Pireaux, P Rudolf, K Maex
Electrochemical and solid-state letters 7 (2), F8, 2003
312003
Minimizing plasma damage and in situ sealing of ultralow- dielectric films by using oxygen free fluorocarbon plasmas
G Mannaert, MR Baklanov, QT Le, Y Travaly, W Boullart, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
292005
X-ray photoelectron spectroscopy and atomic force microscopy investigation of stability mechanism of tris-(8-hydroxyquinoline) aluminum-based light-emitting devices
QT Le, FM Avendano, EW Forsythe, L Yan, Y Gao, CW Tang
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17 (4 …, 1999
291999
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
E Kesters, M Claes, QT Le, M Lux, A Franquet, G Vereecke, PW Mertens, ...
Thin Solid Films 516 (11), 3454-3459, 2008
262008
Sustav trenutno ne može provesti ovu radnju. Pokušajte ponovo kasnije.
Članci 1–20