| Defect detection and classification based on attributes determined from a standard reference image L Gao, AK Ray-Chaudhuri, R Babulnath, K Wu US Patent 10,127,652, 2018 | 20 | 2018 |
| EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems K Sah, A Cross, M Plihal, V Anantha, R Babulnath, D Fung, ... International Conference on Extreme Ultraviolet Lithography 2018 10809, 40-51, 2018 | 20 | 2018 |
| Repeater detection H Chen, K Wu, E Shifrin, M Yamaoka, G Sivaraman, R Babulnath, ... US Patent 9,766,187, 2017 | 12 | 2017 |
| Based sampling and binning for yield critical defects S Kurada, R Babulnath, K Ng, L Gao US Patent 9,310,320, 2016 | 12 | 2016 |
| Adaptive nuisance filter A Liang, M Plihal, R Babulnath, S Venkataraman US Patent 9,835,566, 2017 | 11 | 2017 |
| Dynamic design attributes for wafer inspection T Jayaraman, R Babulnath US Patent 9,865,512, 2018 | 10 | 2018 |
| Sub-pixel alignment of inspection to design S Bhattacharyya, P Kumar, L Gao, T Jayaraman, R Babulnath, ... US Patent 9,996,942, 2018 | 5 | 2018 |
| High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification A Cross, K Sah, V Anantha, B Gupta, R Ynzunza, N Troy, K Wu, ... Extreme Ultraviolet Lithography 2020 11517, 53-60, 2020 | 4 | 2020 |
| Detecting IC Reliability Defects J Wu, E Chang, L Gao, S Kurada, A Park, R Babulnath US Patent App. 14/512,446, 2015 | 4 | 2015 |
| Highly effective and accurate weak point monitoring method for advanced design rule (1x nm) devices J Ahn, SJ Seong, M Yoon, IS Park, HS Kim, D Ihm, S Chin, G Sivaraman, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 3 | 2014 |
| Design based classification for process window defect characterization of BEOL ADI layers YS Kim, YH Kwon, KH Kim, TW Hwang, R Babulnath, C Yu, P Desai 2012 SEMI Advanced Semiconductor Manufacturing Conference, 327-331, 2012 | 2 | 2012 |
| Creating defect samples for array regions V Anantha, M Mariyappan, R Babulnath, G Sivaraman, S Kurada, ... US Patent 10,620,134, 2020 | 1 | 2020 |
| Optical defect inspection solution for EUV stochastics detection V Anantha, R Babulnath, V Kannan, G Sharma, S Kumar, K Sah, A Cross, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 381-386, 2020 | 1 | 2020 |
| Design Based Sampling and Binning for Yield Critical Defects S Kurada, R Babulnath, K Ng, L Gao US Patent App. 15/389,442, 2017 | 1 | 2017 |
| Based sampling and binning for yield critical defects S Kurada, R Babulnath, K Ng, L Gao US Patent 9,563,943, 2017 | 1 | 2017 |
| Missing Via Defect Capture Enhancement Using a Novel, High-Precision Array Segmentation Inspection Technique G Jensen, V Anantha, A Greer, R Babulnath, S Kurada, B Austin, ... 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2021 | | 2021 |
| Photomask A Cross, K Sah, V Anantha, B Gupta, R Ynzunza, N Troy, K Wu, ... | | 2021 |
| Inspection for multiple process steps in a single inspection process OT Baris, R Babulnath US Patent 10,712,289, 2020 | | 2020 |
