Prati
Matthias Wurm
Matthias Wurm
Physikalisch-Technische Bundesanstalt, Braunschweig
Potvrđena adresa e-pošte na ptb.de
Naslov
Citirano
Citirano
Godina
Generation, shaping, and characterization of intense femtosecond pulses tunable from 3 to 20 µm
RA Kaindl, M Wurm, K Reimann, P Hamm, AM Weiner, M Woerner
JOSA B 17 (12), 2086-2094, 2000
4642000
Mathematical modelling of indirect measurements in scatterometry
H Gross, R Model, M Bär, M Wurm, B Bodermann, A Rathsfeld
Measurement 39 (9), 782-794, 2006
1102006
A maximum likelihood approach to the inverse problem of scatterometry
MA Henn, H Gross, F Scholze, M Wurm, C Elster, M Bär
Optics Express 20 (12), 12771-12786, 2012
602012
A new flexible scatterometer for critical dimension metrology
M Wurm, F Pilarski, B Bodermann
Review of Scientific Instruments 81 (2), 2010
502010
Ultrafast dynamics of intersubband excitations in a quasi-two-dimensional hole gas
RA Kaindl, M Wurm, K Reimann, M Woerner, T Elsaesser, C Miesner, ...
Physical Review Letters 86 (6), 1122, 2001
452001
Metrology of nanoscale grating structures by UV scatterometry
M Wurm, J Endres, J Probst, M Schoengen, A Diener, B Bodermann
Optics express 25 (3), 2460-2468, 2017
422017
Deep ultraviolet scatterometer for dimensional characterization of nanostructures: system improvements and test measurements
M Wurm, S Bonifer, B Bodermann, J Richter
Measurement Science and Technology 22 (9), 094024, 2011
362011
EUV and DUV scatterometry for CD and edge profile metrology on EUV masks
B Bodermann, M Wurm, A Diener, F Scholze, H Groß
25th European mask and lithography conference, 1-12, 2009
252009
Investigations of the influence of common approximations in scatterometry for dimensional nanometrology
J Endres, A Diener, M Wurm, B Bodermann
Measurement Science and Technology 25 (4), 044004, 2014
232014
First steps towards a scatterometry reference standard
B Bodermann, PE Hansen, S Burger, MA Henn, H Gross, M Bär, ...
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and …, 2012
212012
A scatterometry inverse problem in optical mask metrology
R Model, A Rathsfeld, H Gross, M Wurm, B Bodermann
Journal of Physics: Conference Series 135 (1), 012071, 2008
192008
Optical metrology of micro-and nanostructures at PTB: status and future developments
B Bodermann, E Buhr, G Ehret, F Scholze, M Wurm
Ninth International Symposium on Laser Metrology 7155, 286-297, 2008
182008
Über die dimensionelle Charakterisierung von Gitterstrukturen auf Fotomasken mit einem neuartigen DUV-Scatterometer
M Wurm
182008
Metrology capabilities and performance of the new DUV scatterometer of the PTB
M Wurm, B Bodermann, F Pilarski
23rd European Mask and Lithography Conference, 1-8, 2007
182007
Evaluation of scatterometry tools for critical dimension metrology
M Wurm, B Bodermann, W Mirandé
DGaO Proc. 106, 2005
142005
Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing
E Agocs, B Bodermann, S Burger, G Dai, J Endres, PE Hansen, L Nielson, ...
Nanoengineering: Fabrication, Properties, Optics, and Devices XII 9556, 153-164, 2015
122015
Efficient Bayesian inversion for shape reconstruction of lithography masks
N Farchmin, M Hammerschmidt, PI Schneider, M Wurm, B Bodermann, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (2), 024001-024001, 2020
112020
Numerical analysis of DUV scatterometry on EUV masks
M Wurm, B Bodermann, R Model, H Gross
Modeling Aspects in Optical Metrology 6617, 352-363, 2007
112007
Novel concept for the ultraprecise and fast measurement of the nanotopography of large wafers
I Weingaertner, M Wurm, RD Geckeler, C Elster, M Schulz, E Dumitrescu, ...
Advanced Characterization Techniques for Optical, Semiconductor, and Data …, 2002
112002
Efficient global sensitivity analysis for silicon line gratings using polynomial chaos
N Farchmin, M Hammerschmidt, PI Schneider, M Wurm, B Bodermann, ...
Modeling aspects in optical metrology VII 11057, 115-121, 2019
102019
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