Prati
Yuk-Hong (Jeff) Ting
Yuk-Hong (Jeff) Ting
University of Wisconsin-Madison/ Lam Research Corporation
Potvrđena adresa e-pošte na lamresearch.com
Naslov
Citirano
Citirano
Godina
Sub‐micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum‐rich and serum‐free media
SA Fraser, YH Ting, KS Mallon, AE Wendt, CJ Murphy, PF Nealey
Journal of biomedical materials research Part A 86 (3), 725-735, 2008
1142008
Plasma etch removal of poly (methyl methacrylate) in block copolymer lithography
YH Ting, SM Park, CC Liu, X Liu, FJ Himpsel, PF Nealey, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
1072008
Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching
YH Ting, CC Liu, SM Park, H Jiang, PF Nealey, AE Wendt
Polymers 2 (4), 649-663, 2010
932010
Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
CC Liu, PF Nealey, YH Ting, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
922007
Tailored ion energy distributions at an rf-biased plasma electrode
XV Qin, YH Ting, AE Wendt
Plasma Sources Science and Technology 19 (6), 065014, 2010
642010
Energy distribution of bombarding ions in plasma etching of dielectrics
FL Buzzi, YH Ting, AE Wendt
Plasma Sources Science and Technology 18 (2), 025009, 2009
612009
Measurement of plasma potential fluctuations by emissive probes in CF4 radio-frequency plasma
D Lee, YH Ting, L Oksuz, N Hershkowitz
Plasma Sources Science and Technology 15 (4), 873, 2006
122006
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography
F Chen, H Jiang, AM Kiefer, AM Clausen, YH Ting, AE Wendt, B Ding, ...
Nanoscale research letters 6, 1-7, 2011
92011
Manipulation of Bias Voltage Waveform to Control Bombarding Ion Energy Distribution
XV Qin, YH Ting, A Wendt
APS Annual Gaseous Electronics Meeting Abstracts, URP. 025, 2009
2009
Manipulation of the bombarding ion energy distribution in fluorocarbon plasma etching
A Wendt, F Buzzi, YH Ting
APS Annual Gaseous Electronics Meeting Abstracts, DT1. 002, 2008
2008
Inferring argon plasma properties from optical emission: the role of metastable atoms
RO Jung, JB Boffard, CC Lin, R Ding, YH Ting, Y Yang, AE Wendt
APS Annual Gaseous Electronics Meeting Abstracts, PR1. 004, 2007
2007
Effect of bombarding ion energy distribution on ion/surface interaction during fluorocarbon plasma etching
A Wendt, S Williams, YH Ting, S Hamaguchi
Bulletin of the American Physical Society, 2005
2005
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