| Automatic Detection of Anatomical Structures in Digital Fundus Retinal Images. AV Sagar, S Balasubramanian, V Chandrasekaran MVA, 483-486, 2007 | 78 | 2007 |
| A novel integrated approach using dynamic thresholding and edge detection (idted) for automatic detection of exudates in digital fundus retinal images AV Sagar, S Balasubramaniam, V Chandrasekaran 2007 International Conference on Computing: Theory and Applications (ICCTA …, 2007 | 47 | 2007 |
| System and method for tracking configuration changes in enterprise product N Mallya, T Sreeramudu, V Sagar, A Venkataramanan, S Uppaiapati, ... US Patent 9,059,898, 2015 | 20 | 2015 |
| EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems K Sah, A Cross, M Plihal, V Anantha, R Babulnath, D Fung, ... International Conference on Extreme Ultraviolet Lithography 2018 10809, 40-51, 2018 | 19 | 2018 |
| System and method for dynamic care area generation on an inspection tool V Ramachandran, R Sanapala, V Anantha, P Measor, R Manepalli, ... US Patent 10,018,571, 2018 | 14 | 2018 |
| Unbiased wafer defect samples M Plihal, V Anantha, S Paramasivam, CW Lee US Patent 8,948,494, 2015 | 13 | 2015 |
| EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems R Sanapala, A Cross, M Preil, J Qian, S Suman, V Anantha, K Sah, ... Photomask Technology 2017 10451, 142-148, 2017 | 6 | 2017 |
| Wafer inspection recipe setup M Plihal, D Gupta, V Anantha, P Vijayaraman, L Deenadayalan US Patent 9,714,905, 2017 | 4 | 2017 |
| Dynamic binning for diversification and defect discovery M Plihal, V Anantha US Patent 9,582,869, 2017 | 3 | 2017 |
| Automatic localization and segmentation of blood vessels, optic disc, and macula in digital fundus images S Balasubramanian, AV Sagar, GV Saradhi, V Chandrasekaran Advances in Communication Systems and Electrical Engineering, 543-564, 2008 | 3 | 2008 |
| High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification A Cross, K Sah, V Anantha, B Gupta, R Ynzunza, N Troy, K Wu, ... Extreme Ultraviolet Lithography 2020 11517, 53-60, 2020 | 2 | 2020 |
| Creating defect samples for array regions V Anantha, M Mariyappan, R Babulnath, G Sivaraman, S Kurada, ... US Patent 10,620,134, 2020 | 2 | 2020 |
| Optical defect inspection solution for EUV stochastics detection V Anantha, R Babulnath, V Kannan, G Sharma, S Kumar, K Sah, A Cross, ... Extreme Ultraviolet (EUV) Lithography XI 11323, 381-386, 2020 | 1 | 2020 |
| A Simple and Fast Algorithm for the Automatic Localization of Optic Disc in Digital Fundus Retinal Images. S Balasubramaniam, AV Sagar, V Chandrasekaran IMECS, 1965-1969, 2007 | 1 | 2007 |
| Reticle qualification and re-qualification for EUV production today and in the future M Li, A Chen, V Anantha, R Shi Photomask Technology 2022 12293, 122930Y, 2022 | | 2022 |
| Missing Via Defect Capture Enhancement Using a Novel, High-Precision Array Segmentation Inspection Technique G Jensen, V Anantha, A Greer, R Babulnath, S Kurada, B Austin, ... 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2021 | | 2021 |
| Photomask A Cross, K Sah, V Anantha, B Gupta, R Ynzunza, N Troy, K Wu, ... | | 2021 |
| Care Areas for Improved Electron Beam Defect Detection V Anantha, Y Arpit, S Paramasivam, M Plihal, J Lin US Patent 10,692,690, 2020 | | 2020 |
| Optical Inspection for EUV ADI Defectivity AC Rahul Lakhawat, Vidyasagar Anantha, Annie Zhang, Kaushik Sah, Shubham ... 2019 Lithography workshop, https://www.lithoworkshop.org/, 2019 | | 2019 |
| EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems D De Simone, R Sanapala, C Andrrew, M Preil, J Qian, S Sumar, ... | | 2017 |
Venkatachalam Chandrasekaran(Retd) Hon. Professor of Mathematics and Computer Science, SSSIHLPotvrđena adresa e-pošte na sssihl.edu.in
