| Dynamics of Photo-Excited Carrier Relaxation in C60 Films T Juhasz, XH Hu, C Suarez, WE Bron, E Maiken, P Taborek Phys. Rev. B 48, 4929, 1993 | 41 | 1993 |
| Method of inferring optical parameters outside of a measurement spectral range AR Forouhi, DA Harrison, E Maiken, J Lam US Patent 6,710,865, 2004 | 24 | 2004 |
| Implications of the varying permeability model for reverse dive profiles DE Yount, EB Maiken, EC Baker Smithsonian Institution Reverse Dive Profiles Workshop, 29-60, 2000 | 24 | 2000 |
| Method of monitoring thin-film processes and metrology tool thereof AR Forouhi, DA Harrison, E Maiken, JC Lam US Patent 6,594,025, 2003 | 20 | 2003 |
| Amorphous carbon films deposited from carbon ions extracted from a discharge in fullerene vapor EB Maiken, P Taborek Journal of Applied Physics 87 (9), 4223-4229, 2000 | 19 | 2000 |
| Ion‐beam Deposition of Hard, Amorphous Carbon from a Fullerene Discharge EB Maiken, P Taborek Journal of Applied Physics 78, 541, 1995 | 17 | 1995 |
| Complementary use of scatterometry and SEM for photoresist profile and CD determination Y Toyoshima, I Kawata, Y Usami, Y Mitsui, A Sezginer, E Maiken, ... Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 8 | 2002 |
| Why Argon? E Maiken AquaCorps Journal, 15-18, 1995 | 4 | 1995 |
| Integrated Critical Dimension Metrology for Lithography Process Control E Maiken, K Johnson, D Likhachev, A Norton, A Sezginer, F Stanke, ... Advanced Equipment Control - Advanced Process Control Conference XIII, pp …, 2001 | 2 | 2001 |
| Magnetic Microscopy of Fe/Mn/Fe Layers H Hopster, Y Iwasaki, J Barthel, EB Maiken, BP Miller, J Kondis, Y Yu Magnetic Ultrathin Films, Multilayers and Surfaces, 75-79, 1997 | 2 | 1997 |
| Bubble Decompression E Maiken Deep Tech 6, 35-38, 1996 | 2 | 1996 |
| Determination of lithography process control metrics by spectroscopic scatterometry EB Maiken, G Raghavendra, C Morales, B Choo Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 1 | 2003 |
| Magnetoresistance Effect Device, and Magnetic Memory Device E Maiken, マイケンエリック JP Patent JP2,008,124,479 A, 2008 | | 2008 |
| Scatterometry characterization of polysilicon gate profiles in a 90 nm logic process EB Maiken Metrology, Inspection, and Process Control for Microlithography XXI 21, 6518, 2007 | | 2007 |
| The Varying Permeability Model: A Decompression Razor E Maiken Quest 3 (1), 2002 | | 2002 |
| Copper CMP process monitoring using an in-line Compact Metrology System (CMS) DV Likhachev, D Gan, E Maiken, F Stanke, KY Ramanujam, G Lee | | 2002 |
| A NEW VPM ALGORITHM FOR REPETITIVE DIVES. DE Yount, EB Maiken, EC Baker Undersea and Hyperbaric Medical Society, 2000 | | 2000 |
| Nonvolatile Random Access Memory Device マイケンエリック， E Maiken JP Patent JP4066477B2, 1999 | | 1999 |
| Spin Polarization Injection Nonvolatile Random Access Memory (SPINOR RAM) E Maiken, ンマイケエリック JP Patent JPH11,120,758 A, 1999 | | 1999 |
| Ion beam deposition of amorphous carbon from a discharge in fullerenes EB Maiken University of California, Irvine, 1996 | | 1996 |
Tibor JuhaszUC IrvinePotvrđena adresa e-pošte na uci.edu
