| Three-Nucleon Charge Radius: A Precise Laser Determination Using He D Shiner, R Dixson, V Vedantham Physical review letters 74 (18), 3553, 1995 | 142 | 1995 |
| Determination of optimal parameters for CD-SEM measurement of line-edge roughness BD Bunday, M Bishop, DW McCormack Jr, JS Villarrubia, AE Vladar, ... Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004 | 115 | 2004 |
| Precise measurement of the Lamb shift and fine structure of the 2S-2P transition in triplet helium D Shiner, R Dixson, P Zhao Physical review letters 72 (12), 1802, 1994 | 115 | 1994 |
| Traceable calibration of critical-dimension atomic force microscope linewidth measurements with nanometer uncertainty RG Dixson, RA Allen, WF Guthrie, MW Cresswell Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 106 | 2005 |
| Scanning probe microscope dimensional metrology at NIST JA Kramar, R Dixson, NG Orji Measurement science and technology 22 (2), 024001, 2010 | 78 | 2010 |
| Higher order tip effects in traceable CD-AFM-based linewidth measurements NG Orji, RG Dixson Measurement Science and Technology 18 (2), 448, 2007 | 70 | 2007 |
| Accurate dimensional metrology with atomic force microscopy RG Dixson, RGJ Koening, J Fu, TV Vorburger, BT Renegar Metrology, Inspection, and Process Control for Microlithography XIV 3998 …, 2000 | 66 | 2000 |
| Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope NG Orji, RG Dixson, A Martinez, BD Bunday, JA Allgair, TV Vorburger Journal of Micro/Nanolithography, MEMS and MOEMS 6 (2), 023002-023002-10, 2007 | 63 | 2007 |
| CD-AFM reference metrology at NIST and SEMATECH R Dixson, J Fu, N Orji, W Guthrie, R Allen, M Cresswell Metrology, Inspection, and Process Control for Microlithography XIX 5752 …, 2005 | 60 | 2005 |
| Line edge roughness metrology using atomic force microscopes NG Orji, TV Vorburger, J Fu, RG Dixson, CV Nguyen, J Raja Measurement Science and Technology 16 (11), 2147, 2005 | 59 | 2005 |
| RM 8111: Development of a prototype linewidth standard MW Cresswell, WF Guthrie, RG Dixson, RA Allen, CE Murabito, ... Journal of Research of the National Institute of Standards and Technology …, 2006 | 58 | 2006 |
| Conformal oxides on Si surfaces V Tsai, XS Wang, ED Williams, J Schneir, R Dixson Applied physics letters 71 (11), 1495-1497, 1997 | 56 | 1997 |
| Reference metrology using a next-generation CD-AFM R Dixson, A Guerry Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004 | 51 | 2004 |
| Improving optical measurement accuracy using multi-technique nested uncertainties RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 50 | 2009 |
| Dimensional metrology with the NIST calibrated atomic force microscope RG Dixson, RGJ Koening, VWC Tsai, J Fu, TV Vorburger Metrology, Inspection, and Process Control for Microlithography XIII 3677, 20-34, 1999 | 48 | 1999 |
| Dimensional metrology with the NIST calibrated atomic force microscope RG Dixson, RGJ Koening, VWC Tsai, J Fu, TV Vorburger Metrology, Inspection, and Process Control for Microlithography XIII 3677, 20-34, 1999 | 48 | 1999 |
| Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn Light: Science & Applications 5 (2), e16038-e16038, 2016 | 47 | 2016 |
| TSOM method for semiconductor metrology R Attota, RG Dixson, JA Kramar, JE Potzick, AE Vladár, B Bunday, ... Metrology, Inspection, and Process Control for Microlithography XXV 7971 …, 2011 | 47 | 2011 |
| Intercomparison of SEM, AFM, and electrical linewidths JS Villarrubia, RG Dixson, SN Jones, JR Lowney, MT Postek Jr, RA Allen, ... Metrology, Inspection, and Process Control for Microlithography XIII 3677 …, 1999 | 46 | 1999 |
| Comparison of line width calibration using critical dimension atomic force microscopes between PTB and NIST G Dai, K Hahm, H Bosse, RG Dixson Measurement Science and Technology 28 (6), 065010, 2017 | 43 | 2017 |
