Follow
Matthew Weimer
Matthew Weimer
Principal R&D Scientist, Forge Nano
Verified email at forgenano.com
Title
Cited by
Cited by
Year
Conformal coating of a phase change material on ordered plasmonic nanorod arrays for broadband all-optical switching
P Guo, MS Weimer, JD Emery, BT Diroll, X Chen, AS Hock, RPH Chang, ...
ACS nano 11 (1), 693-701, 2017
612017
Oxygen-free atomic layer deposition of indium sulfide
RF McCarthy, MS Weimer, JD Emery, AS Hock, ABF Martinson
ACS applied materials & interfaces 6 (15), 12137-12145, 2014
472014
Template-free vapor-phase growth of patrónite by atomic layer deposition
MS Weimer, RF McCarthy, JD Emery, MJ Bedzyk, FG Sen, A Kinaci, ...
Chemistry of Materials 29 (7), 2864-2873, 2017
432017
V x In (2–x) S3 Intermediate Band Absorbers Deposited by Atomic Layer Deposition
RF McCarthy, MS Weimer, RT Haasch, RD Schaller, AS Hock, ...
Chemistry of Materials 28 (7), 2033–2040, 2016
392016
Oxidation state discrimination in the atomic layer deposition of vanadium oxides
MS Weimer, IS Kim, P Guo, RD Schaller, ABF Martinson, AS Hock
Chemistry of Materials 29 (15), 6238-6244, 2017
282017
A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes
JA Klug, MS Weimer, JD Emery, A Yanguas-Gil, S Seifert, CM Schlepütz, ...
Review of Scientific Instruments 86 (11), 2015
252015
Conformal deposition of silicon carbide films using heterogeneous precursor interaction
MS Weimer, BN Varadarajan, B Gong, Z Gui
US Patent App. 16/044,357, 2018
202018
Heteroepitaxy of group IV-VI nitrides by atomic layer deposition
JA Klug, NG Becker, NR Groll, C Cao, MS Weimer, MJ Pellin, ...
Applied Physics Letters 103 (21), 2013
192013
Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors
BN Varadarajan, MS Weimer, GHL Savithra, B Gong, Z Gui
US Patent App. 16/044,371, 2018
182018
Synthetic and spectroscopic study of the mechanism of atomic layer deposition of tin dioxide
MS Weimer, B Hu, SJ Kraft, RG Gordon, CU Segre, AS Hock
Organometallics 35 (9), 1202-1208, 2016
172016
Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films
MS Weimer, BN Varadarajan
US Patent 10,840,087, 2020
112020
Comparison of Ligand Architecture on Vapor Deposition Precursors: Synthesis, Characterization, and Reactivity of Volatile Cadmium Bis-Amidinate Complexes
MJ Foody, MS Weimer, H Bhandari, AS Hock
Inorganic Chemistry 60 (9), 6191-6200, 2021
52021
MACS Appl. Mater
RF McCarthy, MS Weimer, JD Emery, AS Hock, ABF Martinson
Interfaces 6, 12137, 2014
52014
Conformal deposition of silicon carbide films using heterogeneous precursor interaction
MS Weimer, BN Varadarajan, B Gong, Z Gui
US Patent App. 18/175,513, 2023
22023
Chemical and spatial control of substitutional intermediate band materials: Toward the atomic layer deposition of V0.25In1.75SP3
RF McCarthy, MS Weimer, AS Hock, ABF Martinson
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC), 0250-0253, 2014
22014
High density, modulus, and hardness amorphous carbon films at low pressure
MS Weimer, R Puthenkovilakam, GA Macdonald, S Zhang, SK Lee, J Xue, ...
US Patent App. 17/753,208, 2022
12022
How Low Can You Go? Nanoscale Membranes for Efficient Water Electrolysis
LA Cohen, MS Weimer, K Yim, J Jin, DV Fraga Alvarez, AA Dameron, ...
ACS Energy Letters 9, 1624-1632, 2024
2024
Depositing a carbon hardmask by high power pulsed low frequency RF
MS Weimer, P Subramonium, R Puthenkovilakam, R Bai, D French
US Patent 11,837,441, 2023
2023
Robust ashable hard mask
MS Weimer, R Puthenkovilakam, KS Reddy
US Patent App. 18/245,950, 2023
2023
Deposition rate enhancement of amorphous carbon hard mask film by purely chemical means
MS Weimer, R Puthenkovilakam, KS Reddy, CJ Hsu
US Patent App. 18/247,060, 2023
2023
The system can't perform the operation now. Try again later.
Articles 1–20